h o m e    p a g e

8282 Halsey Road
Whitesboro, NY 13492
Phone: (315) 736-5480
Fax: (315) 736-9321


For further information,
please contact:
Deborah Delluomo
Phone: (315) 736-5480 ext. 2202

mail to:dadelluomo@ors-labs.com

Auger Electron Spectroscopy

Auger electron spectroscopy (AES) determines the elemental composition of conductive and semiconductive surfaces. This information can then be utilized to solve problems associated with surface appearance, cleanliness and bondability.

Principles of Operation
An electron beam bombarding a solid surface excites electrons from core electronic energy levels of atoms. A deep core electron is knocked out of an atom, a shallower
level electron drops into the deep core level hole, and its energy loss is transferred to another shallower-lying electron which can be ejected (the Auger electron). The kinetic energy spectrum is used to identify the atom of origin and its concentration. Small spot size electron beams used to excite Auger electrons can be used to produce
secondary electron images and, by tuning to a particular Auger transition energy, produce elemental surface maps of high lateral resolution.

Information Obtained
° Surface composition analysis for metals, powders, semiconductors, many
   insulators, single crystal surfaces, fracture surfaces
° Identification of particulates, localized dopants or contaminants, visual defects
° Investigation of submicrometer dimension structures
° Grain boundary investigations, e.g. intergranular corrosion
° Analysis of surface coatings and thin films
° When combined with ion sputtering, elemental depth profiling of surface
   and/or interfacial layers

Advantages
° Monolayer-sensitive surface analysis with high spatial resolution
° Elemental mapping across surface
° Elemental depth profiling with uniform sensitivity

Sensitivity and Resolution
° Surface Sensitivity: < 1 nm
° Lateral Resolution: < 50 nm
° Analytical Volume: 10-18 cm3
° Sensitive to all elements except hydrogen and helium with detection limits
   of 0.1-1% atomic or 0.1 monolayer

Instrumentation
° VG Microlab 310 Series D High Resolution Scanning Auger Microprobe  
   equipped with a liquid metal ion gun, VG SIMS MM12-12 SIMS with
   positive and negative ion detection and a VG 5250 Data System
° PHI 590 High Resolution Scanning Auger Electron Microprobe equipped with
   an ion sputter gun, PC based elemental mapping and digital imaging

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